Description

• Microprocessor controller allows for complete automatic processing.*
• All internal surfaces are inert to CO2 and ultra pure alcohols.*
• Repeatable operating parameters insuring reproducibility of results.*
• Integrated temperature controls.*
• Internal rupture disc built in for safety. *
• Processes up to 5 x 4″ diam. wafers per run; comes with additional HF compatible wafer holders to process 5 x 3″, 5 x 2″ diameter wafers or 5 x 10mm square die (Tousimis HF compatible Wafer Holders* can be used to transport and process your wafers and die from HF).
• All electronic components meet CE, UL and/or U.S. Military Specifications.
• Static pressure control module pre-set for automatic safe pressure stability.
• 0.08µm internal filtration system delivers clean filtered LCO2 to process chamber. *
• Under-lit chamber with viewing window facilitates operator chamber status viewing.
• An efficient adiabatic cooling system*, capable of cooling the chamber from ambient room temperature to near 0°C, in less than 3 minutes and maintains temperature automatically during both FILL and PURGE modes.*
• LED’s instantly indicate process mode at a glance.*
• Clean room static-free compatible design.
• For added safety and convenience, the U.S. Patented SOTER™ condenser* quietly captures exhaust and alcohols.
• Unique chamber inserts* allow variance of chamber I.D. This maximizes efficiency in LCO2 consumption and processing time.
• Cabinet: 14.25″ (36.2cm) Width x 11.75″ (29.8cm) Height x 25″ (63.5cm) Length
• System Set-Up Area Required: 42″ (107cm) Width x 30″ (76cm) Depth
• Chamber size: 4.50″ I.D. x 1.25″ depth Chamber volume: 326 ml
• Temperature gauge range: -30°C to 60°C, Pressure gauge range: 0 to 2,000psi