Description

• Bright LCD Touchscreen Control
• Use Factory Default Automatic Settings or Create Custom Recipes
• Optional “Stasis Software” (Patent Pending) for versatile sample types
• Process up to 5 wafers per process run with each system
• HF Compatible Wafer Holders and 10mm square holder included with each system
• Tousimis® HF compatible Wafer Holders may be used to etch and process your wafers minimizing handling
• Unique chamber inserts easily reduce chamber ID decreasing LCO2 consumption
• High efficiency internal closed loop refrigeration integration
• “Vortex Swirl” non-mechanical purge stirring (Patent Pending) eliminates moving parts for easy maintenance
• Repeatable operating parameters insuring “reproducibility” of results
• Static pressure control module helps insure automatic safe pressure stability
• Internal filtration system delivers clean LCO2 into process chamber down to 0.08µm
• New ‘Slow Fill’ Control for the most delicate Sample Types
• LCO2 flow is controlled through Micro Metering Valves with Vernier handles for precise flow control and easy position setting readjustment
• Chamber illumination with view port facilitates chamber status visualization
• All internal surfaces are inert to CO2, Acetone and Ultrapure Alcohols
• Cleanroom static-free compatible design
• External mounted Post Purge Filter Assembly for EZ preventive maintenance maintenance
• The patented internal SOTER™ Condenser quietly captures and separates CO2 exhaust and waste alcohols
• All electronic components meet CE, UL and/or U.S. Military Specifications
• Cabinet: 19.8″ (50.3cm) Width x 31.7″ (80.6cm) Depth x 44.5″ (113.0cm) Height
• System Set-Up Area Footprint: 27″ (68.6cm) Width x 38″ (96.5cm) Depth x 44.5″ (113cm) Height